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Effects of Plasma Prenitridation and Postdeposition Annealing on the Structural and Dielectric Characteristics of the Ta[sub 2]O[sub 5]/Si System

✍ Scribed by Lai, Yi-Sheng; Chen, Kuan-Jen; Chen, J. S.

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Influence of postdeposition annealing on

✍ Joshi, P. C.; Cole, M. W. 📂 Article 📅 1999 🏛 American Institute of Physics 🌐 English ⚖ 468 KB

Effect of Annealing on the Structural an

✍ Pan, Tung-Ming; Huang, Chun-Chin; You, Shi-Xian; Yeh, Chih-Cheng 📂 Article 📅 2008 🏛 The Electrochemical Society 🌐 English ⚖ 405 KB

Quantum-confinement effects on the optic

✍ Kohiki, Shigemi; Takada, Syozo; Shimizu, Akihiko; Yamada, Kenichi; Higashijima, 📂 Article 📅 2000 🏛 American Institute of Physics 🌐 English ⚖ 371 KB

Effect of postdeposition annealing on th

✍ Tung-Ming Pan; Chih-Hung Lu 📂 Article 📅 2011 🏛 Elsevier Science 🌐 English ⚖ 752 KB

Lithiation and Electrochromic Characteri

✍ Fu, Zheng-Wen; Qin, Qi-Zong 📂 Article 📅 2000 🏛 The Electrochemical Society 🌐 English ⚖ 205 KB

Effect of hygroscopic nature on the elec

✍ Jeon, Sanghun; Hwang, Hyunsang 📂 Article 📅 2003 🏛 American Institute of Physics 🌐 English ⚖ 293 KB