๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Effects of Oxygen Partial Pressure and Annealing Temperature on the Formation of Sputtered Tungsten Oxide Films

โœ Scribed by Bittencourt, C.; Landers, R.; Llobet, E.; Molas, G.; Correig, X.; Silva, M. A. P.; Sueiras, J. E.; Calderer, J.

Book ID
126507872
Publisher
The Electrochemical Society
Year
2002
Tongue
English
Weight
257 KB
Volume
149
Category
Article
ISSN
0013-4651

No coin nor oath required. For personal study only.

๐Ÿ“œ SIMILAR VOLUMES

Effect of oxygen partial pressure on PLD
Effect of oxygen partial pressure on PLD cobalt oxide films
โœ S. Laureti; E. Agostinelli; G. Scavia; G. Varvaro; V. Rossi Albertini; A. Genero ๐Ÿ“‚ Article ๐Ÿ“… 2008 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 521 KB

Thin CoO oxide layers with superior properties in terms of crystallographic ordering, surface roughness and constant and controlled chemical compositions have been prepared by pulsed laser deposition in reactive O 2 atmosphere at 400 8C. Such systems are particularly suitable both for applications a