✦ LIBER ✦

Effects of nitrogen trifluoride on the properties of plasma-enhanced chemical-vapor-deposited semi-insulating polysilicon films

✍ Scribed by R.M. Ranade; S.S. Ang; W.D. Brown

Publisher: Elsevier Science
Year: 1995
Tongue: English
Weight: 778 KB
Volume: 258
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(94)06364-8

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

The effects of rapid thermal annealing o

The effects of rapid thermal annealing on the properties of plasma-enhanced chemically vapor-deposited silicon nitride

✍ W.D. Brown; M.A. Khaliq 📂 Article 📅 1990 🏛 Elsevier Science 🌐 English ⚖ 559 KB

Remote microwave plasma-enhanced chemica

Remote microwave plasma-enhanced chemical vapour deposition of insulating coatings (SiO2) on metallic substrates: film properties

✍ C. Régnier; P. Tristant; J. Desmaison 📂 Article 📅 1996 🏛 Elsevier Science 🌐 English ⚖ 773 KB

The effects of substrate and annealing a

The effects of substrate and annealing ambient on the electrical properties of Ta2O5 thin films prepared by plasma enhanced chemical vapor deposition

✍ Sun-Oo Kim; Hyeong Joon Kim 📂 Article 📅 1994 🏛 Elsevier Science 🌐 English ⚖ 418 KB

The effect of substrate temperature on t

The effect of substrate temperature on the composition and growth of tantalum oxide thin films deposited by plasma-enhanced chemical vapour deposition

✍ Sun-Oo Kim; Jeong Soo Byun; Hyeong Joon Kim 📂 Article 📅 1991 🏛 Elsevier Science 🌐 English ⚖ 501 KB

Effect of deposition temperature on the

Effect of deposition temperature on the properties of thin polymer films deposited by plasma-enhanced CVD using cyclo-hexa-hydrocarbons as monomers

✍ Kazunori Moriki; Tetsuji Satoh; Atsushi Itabashi; Motoshige Yumoto 📂 Article 📅 2010 🏛 Wiley (John Wiley & Sons) 🌐 English ⚖ 454 KB 👁 2 views

## Abstract Plasma CVD is a candidate technology for the fabrication of optical polymer waveguides. It can deposit a film on any surface geometry and any substrate material at a temperature under 200 °C in a vacuum process. It also provides good thickness controllability and uniformity of the depos

7223. The effects of rapid thermal annea

7223. The effects of rapid thermal annealing on the properties of plasma enhanced chemically vapor-deposited silicon nitride: W D Brown and M A Khaliq,Thin Solid Films, 186, 1990, 73–85

📂 Article 📅 1991 🏛 Elsevier Science 🌐 English ⚖ 153 KB