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Effects of (NH[sub 4])[sub 2]S and NH[sub 4]OH surface treatments prior to SiO[sub 2] capping and thermal annealing on 1.3 μm GaInAsN/GaAs quantum well structures

✍ Scribed by Polojärvi, V.; Salmi, J.; Schramm, A.; Tukiainen, A.; Guina, M.; Pakarinen, J.; Arola, E.; Lång, J.; Väyrynen, I. J.; Laukkanen, P.


Book ID
120618815
Publisher
American Institute of Physics
Year
2010
Tongue
English
Weight
631 KB
Volume
97
Category
Article
ISSN
0003-6951

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