Effects of model polymer chain architectures and molecular weight of conventional and chemically amplified photoresists on line-edge roughness. Stochastic simulations

✍ Scribed by George P. Patsis; Evangelos Gogolides

• Publisher: Elsevier Science
• Year: 2006
• Tongue: English
• Weight: 357 KB
• Volume: 83
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2006.01.039