Effect of temperature on the mutual diff
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Matteo Bosi; Giovanni Attolini; Claudio Ferrari; Cesare Frigeri; Marco Calicchio
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Article
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2011
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Elsevier Science
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English
β 394 KB
We studied the diffusion of Ge, As and Ga in GaAs/Ge and Ge/GaAs epilayers grown at different temperatures by metal-organic vapor phase epitaxy using iso-butylgermane, arsine and trimethylgallium in hydrogen atmosphere at low pressure. The use of low temperature buffer layers was investigated in ord