Indium tin oxide (ITO) thin film prepared by rf sputtering at various Ar-O 2 mixtures, were annealed at several temperatures. The electrical, optical and structural properties of the film were systematically investigated before and after post-thermal treatment. The influence of a reactive gas (O 2 )
β¦ LIBER β¦
Effects of ion damage on the surface of ITO films during plasma treatment
β Scribed by Hyunjung Shin; Chanhyung Kim; Changdeuck Bae; Jang-Sik Lee; Jaegab Lee; Sunghan Kim
- Publisher
- Elsevier Science
- Year
- 2007
- Tongue
- English
- Weight
- 958 KB
- Volume
- 253
- Category
- Article
- ISSN
- 0169-4332
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