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Effects of H2 gas addition into process and H ion implantation on the microstructure of hydrogenated amorphous carbon films prepared by bipolar-type plasma based ion implantation

✍ Scribed by Nakao, Setsuo; Matsumoto, Akihiro; Soga, Tetsuo; Kishi, Naoki

No coin nor oath required. For personal study only.

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