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Effect of deposition parameter on hardness of amorphous carbon film prepared by plasma immersion ion implantation using C2H2

✍ Scribed by A. Mitsuo; S. Uchida; K. Morikawa; M. Kawaguchi; K. Shiotani; H. Suzuki

Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
290 KB
Volume
257
Category
Article
ISSN
0168-583X

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