Effects of gas flow rate on the etch characteristics of a low-ksicoh film with an amorphous carbon mask in dual-frequency CF4/C4F8/Ar capacitively-coupled plasmas

✍ Scribed by Bong-Soo Kwon, Hea-Lim Lee, Nae-Eung Lee, Chang-Young Kim, Chi Kyu Choi

• Book ID: 119937344
• Publisher: The Korean Physical Society
• Year: 2013
• Tongue: English
• Weight: 346 KB
• Volume: 62
• Category: Article
• ISSN: 0374-4884
• DOI: 10.3938/jkps.62.67