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Effects of dopant (Al, Ga, and In) on the characteristics of ZnO thin films prepared by RF magnetron sputtering system

✍ Scribed by Kyu Ung Sim; Seung Wook Shin; A.V. Moholkar; Jae Ho Yun; Jong Ha Moon; Jin Hyeok Kim

No coin nor oath required. For personal study only.

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