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Effects of aperture size and pressure on XeF2etching of silicon

✍ Scribed by K. Su; O. Tabata

Book ID
106184515
Publisher
Springer-Verlag
Year
2002
Tongue
English
Weight
187 KB
Volume
9
Category
Article
ISSN
0946-7076

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πŸ“œ SIMILAR VOLUMES

Non-thermal effects in laser-enchanced e
Non-thermal effects in laser-enchanced etching of silicon by XeF2
✍ F.A. Houle πŸ“‚ Article πŸ“… 1983 πŸ› Elsevier Science 🌐 English βš– 412 KB

Mass spectrometric studies of the products of the reaction of XeFz with silicon in the dark and under visible illumination have been carried out. The data show that photoenhancement of the reaction is substantiaUy different from thermal enhancement. It is proposed that photogenerated charge carriers