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Effects of annealing conditions on charge storage of Si nanocrystal memory devices obtained by low-energy ion beam synthesis

โœ Scribed by P. Normand; E. Kapetanakis; P. Dimitrakis; D. Skarlatos; D. Tsoukalas; K. Beltsios; A. Claverie; G. Benassayag; C. Bonafos; M. Carrada; N. Cherkashin; V. Soncini; A. Agarwal; Ch. Sohl; M. Ameen


Book ID
114155564
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
177 KB
Volume
67-68
Category
Article
ISSN
0167-9317

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Ion implantation of 20 keV 12 C + ions into (1 0 0), p-type silicon with ion fluence of 8 โ€ข 10 16 at. cm ร€2 followed by an electron beam annealing under high vacuum conditions has been performed to investigate the formation of crystalline nano-scale SiC features on the silicon surface. Depending on