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Effects of accelerated ion beam deposition to form thin metal films on silicon

✍ Scribed by S. Iida; T. Shindo; S. Matsuura; Y. Ashimura


Book ID
114168364
Publisher
Elsevier Science
Year
1997
Tongue
English
Weight
307 KB
Volume
121
Category
Article
ISSN
0168-583X

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