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Effective attenuation lengths for photoelectrons in thin films of silicon oxynitride and hafnium oxynitride on silicon

✍ Scribed by C. J. Powell; W. S. M. Werner; W. Smekal; G. Tasneem

Book ID: 118213351
Publisher: John Wiley and Sons
Year: 2012
Tongue: English
Weight: 571 KB
Volume: 45
Category: Article
ISSN: 0142-2421
DOI: 10.1002/sia.5103

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