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Effect of wet chemical substrate pretreatment on the growth behavior of Ta(N) films deposited by thermal ALD

✍ Scribed by S. Strehle; H. Schumacher; D. Schmidt; M. Knaut; M. Albert; J.W. Bartha

Publisher: Elsevier Science
Year: 2008
Tongue: English
Weight: 455 KB
Volume: 85
Category: Article
ISSN: 0167-9317
DOI: 10.1016/j.mee.2008.04.020

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