Effect of transient annealing on patterned CoFeB-based magnetic tunnel junctions

✍ Scribed by Wu, Kuo-Ming ;Huang, Chao-Hsien ;Lin, Shiao-Chi ;Kao, Ming-Jer ;Tsai, Ming-Jinn ;Wu, Jong-Ching ;Horng, Lance

• Publisher: John Wiley and Sons
• Year: 2007
• Tongue: English
• Weight: 205 KB
• Volume: 204
• Category: Article
• ISSN: 0031-8965
• DOI: 10.1002/pssa.200777329

✦ Synopsis

Abstract

In this study, the transient annealing effect on the switching behavior of microstructured Co~60~Fe~20~B~20~‐based magnetic tunnel junctions has been studied through magnetoresistacne measurements (R‐H loop). Elliptical shape of devices with long/short axis of 4/2 micrometers was patterned out of sheet film stack of: Ta (20)/ PtMn (15)/ CoFeB (3)/ Al (0.7)‐oxide/ CoFeB (2)/ Ru (8)/ Ta (40) (thickness unit in nanometers) after a conventional long time field cooling annealing. The transient annealing was then executed by sample loading into a furnace with pre‐set temperatures ranging from 100 to 400 °C for only 5 minutes in the absence of any external magnetic field. The vortex‐like reverse of free layer in as‐etched MTJ evidently changes to single‐domain‐like reverser after 200∼250 °C transient annealing. The magnetoresistance was found to increase with increasing annealing temperatures up to 265 °C and then slowly decrease at higher annealing temperatures. The transient thermal annealing creates obvious efforts to repair magnetic properties of MTJ cell befor 265 °C annealing and results in less damage at temperature of 350 °C and 400 °C. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)