Effects of sputtering pressure and nitro
โ
Hwan-Chul Lee; Jai-Young Lee
๐
Article
๐
1994
๐
Springer US
๐
English
โ 559 KB
Aluminium-nitride films were prepared on glass substrates by reactive radio frequency (r.f.) magnetron sputtering in argon/nitrogen gas mixtures containing 25 --~ 75% nitrogen at substrate temperatures below 150 ยฐC. It is important to control the crystallographic orientation and the surface morpholo