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Effect of the Nanoparticles on the Structure and Crystallization of Amorphous Silicon Thin Films Produced by rf Glow Discharge

✍ Scribed by Bertran, E.; Sharma, S. N.; Viera, G.; Costa, J.; St'ahel, P.; Cabarrocas, P. Roca i

Book ID
111983401
Publisher
Cambridge University Press
Year
1998
Tongue
English
Weight
593 KB
Volume
13
Category
Article
ISSN
0884-2914

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## Abstract Depth profiles of nickel thin films on silicon obtained with a Grimm glow discharge lamp operating at various conditions were compared. The best conditions for the profile analysis are: high argon pressure, high discharge current and low discharge voltage. The signal response at the int