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Effect of texture and grain structure on electromigration in Al-0.5%Cu thin films

✍ Scribed by S. Vaidya; A.K. Sinha

Publisher
Elsevier Science
Year
1981
Tongue
English
Weight
407 KB
Volume
75
Category
Article
ISSN
0040-6090

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The structural, electrical and optical properties of AgGa(Se 0.5 S 0.5 ) 2 thin films deposited by using the thermal evaporation method have been investigated as a function of annealing in the temperature range of 450-600 Β°C. X-ray diffraction (XRD) analysis showed that the structural transformation