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Effect of substrate temperature on properties of thin films prepared by RF sputtering from CuInSe2 target with Na2Se

✍ Scribed by Tooru Tanaka; Toshiyuki Yamaguchi; Akihiro Wakahara; Akira Yoshida


Book ID
114086657
Publisher
Elsevier Science
Year
1999
Tongue
English
Weight
340 KB
Volume
343-344
Category
Article
ISSN
0040-6090

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TiO 2 thin films were deposited on unheated and heated glass substrates at an elevated sputtering pressure of 3 Pa by radio frequency (RF) reactive magnetron sputtering. TiO 2 films deposited at room temperature were annealed in air for 1 h at various temperatures ranging from 300 to 600 Β°C. The str