Effect of sputtering parameters and sample size on giant magnetoimpedance effect in NiFe and NiFe/Cu/NiFe films
β Scribed by Lei Chen; Yong Zhou; Chong Lei; Zhi-Min Zhou
- Book ID
- 103844640
- Publisher
- Elsevier Science
- Year
- 2010
- Tongue
- English
- Weight
- 894 KB
- Volume
- 172
- Category
- Article
- ISSN
- 0921-5107
No coin nor oath required. For personal study only.
π SIMILAR VOLUMES
## Abstract Conventional NiFe/Cu/NiFe/IrMn multilayer spinβvalve structure is used for patterning planar Hall effect (PHE) sensor fabrication. The three different junctions, 50Γ50 ΞΌm^2^, 20Γ20 ΞΌm^2^ and 5Γ5 ΞΌm^2^, were prepared by lithography technique for obtaining the PHE profiles. The PHE measur
A study of the variation of the magnetoresistance in radio frequency magnetron sputtered CoFe/Cu/NiFe tri-layered thin films with thickness t Cu and substrate temperature (T s ) is performed. The magnetoresistance is measured for fields applied parallel to the current at room temperature. The depend