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Effect of sputtering bias voltage on the structure and properties of Zr–Ge–N diffusion barrier films

✍ Scribed by Lin, L.W.; Liu, B.; Ren, D.; Zhan, C.Y.; Jiao, G.H.; Xu, K.W.

Book ID
123544344
Publisher
Elsevier Science
Year
2013
Tongue
English
Weight
624 KB
Volume
228
Category
Article
ISSN
0257-8972

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We report an investigation concerning the influence of ion bombardment on the nanostructure and physical properties of Zr-Si-N nanocomposite thin films. The films were deposited by reactive magnetron sputtering from individual Zr and Si targets. The Si content was varied by changing the power applie