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Effect of source materials on film thickness and compositional uniformity of MOCVD-P(Zr,Ti)O3 films

✍ Scribed by Hiroshi Funakubo; Atsushi Nagai; Gouji Asano; June-Mo Koo; Sang-Min Shin; Youngsoo Park

Publisher: Elsevier Science
Year: 2007
Tongue: English
Weight: 993 KB
Volume: 201
Category: Article
ISSN: 0257-8972
DOI: 10.1016/j.surfcoat.2007.04.114

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✦ Synopsis

What effect Zr and Ti source materials had on the conformality of film thickness and composition inside trench substrates was investigated for MOCVD-Pb(Zr,Ti)O 3 thin films deposited by three kinds of source systems. The dependence of the deposition rate on temperature could almost be divided into two deposition-temperature regions and their boundary temperatures depended on the source systems used. The conformality of film thickness and composition also depended on the source systems, which indicated how important the selection of the source materials system was. We found that a source system of Pb(C 11 H 19 O 2 ) 2 -Zr(O(CH 3 ) 2 CH 2 CH 2 OCH 3 ) 4 -Ti(OC(CH 3 ) 2 CH 2 OCH 3 ) 4 -O 2 was the most suited to obtain uniform film thickness and composition over a wide range of deposition temperatures.

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