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Structure evolution and stoichiometry control of Pb(Zr, Ti)O3 thick films fabricated by electrospray assisted vapour deposition

✍ Scribed by Jing Du; Yiquan Wu; Kwang-Leong Choy; Philip H. Shipway


Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
808 KB
Volume
256
Category
Article
ISSN
0169-4332

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## Abstract The integration and the device realization of Pb(Zr, Ti)O~3~ (PZT) thick films on Si substrates are known to be extremely difficult because the processing temperature of the PZT thick film is close to the melting point of Si. However, PZT thick‐film devices on Si warrant attention as th