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Effect of silane flow rate on structural, electrical and optical properties of silicon thin films grown by VHF PECVD technique

✍ Scribed by Gope, Jhuma; Kumar, Sushil; Sudhakar, S.; Rauthan, C.M.S.; Srivastava, P.C.

Book ID: 121455805
Publisher: Elsevier Science
Year: 2013
Tongue: English
Weight: 1023 KB
Volume: 141
Category: Article
ISSN: 0254-0584
DOI: 10.1016/j.matchemphys.2013.04.028

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