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Effect of rf power on the structure and related gap states in hydrogenated amorphous silicon

โœ Scribed by Suvarna Babras; S.V. Rajarshi; R.O. Dusane; V.G. Bhide; S.T. Kshirsagar


Book ID
115987384
Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
348 KB
Volume
119
Category
Article
ISSN
0022-3093

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We observe a reversible photo-induced modification in the bulk density of gap states in hydrogenated amorphous silicon associated with the Staebler-Wronski effect. Detailed analysis of deep level transient spectroscopy, admittance and thermally stimulated capacitance measurements indicates that as a