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Effect of Pt, Pd, Au additives on the surface and in the bulk of tin dioxide thin films on the electrical and gas-sensitive properties

✍ Scribed by Sevastyanov, E. Y.; Maksimova, N. K.; Novikov, V. A.; Rudov, F. V.; Sergeychenko, N. V.; Chernikov, E. V.

Book ID
114992443
Publisher
Springer
Year
2012
Tongue
English
Weight
496 KB
Volume
46
Category
Article
ISSN
1063-7826

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Tin dioxide films are elaborated by a chemical vapour deposition (CVD) method. An accurate control of deposition parameters (temperature, total pressure, duration) so that appropriate annealing conditions (duration, temperature) can be used to modify the structural properties of the films : grain si