Tin dioxide thin-film gas sensor prepare
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L. Bruno; C. Pijolat; R. Lalauze
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Article
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1994
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Elsevier Science
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English
β 405 KB
Tin dioxide films are elaborated by a chemical vapour deposition (CVD) method. An accurate control of deposition parameters (temperature, total pressure, duration) so that appropriate annealing conditions (duration, temperature) can be used to modify the structural properties of the films : grain si