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Effect of processing conditions on inversion layer mobility and interface state density in 4H−SiC MOSFETs

✍ Scribed by S. Banerjee; K. Chatty; T. P. Chow; R. J. Gutmann


Book ID
107452602
Publisher
Springer US
Year
2001
Tongue
English
Weight
324 KB
Volume
30
Category
Article
ISSN
0361-5235

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