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Effect of plasma process-induced damage on bias temperature instability of MOSFETs

✍ Scribed by T.S. Jang; M.H. Ha; K.D. Yoo; B.K. Kang

Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
388 KB
Volume
83
Category
Article
ISSN
0167-9317

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