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Effect of plasma duct bias on the plasma characteristics of a filtered vacuum arc source

✍ Scribed by Jong-Kuk Kim; Do-Geun Kim; Eungsun Byon; Sunghun Lee; Kwang-Ho Kim; Gun-Hwan Lee

Book ID
108388742
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
144 KB
Volume
444
Category
Article
ISSN
0040-6090

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## Abstract High‐quality titanium nitride (TiN) films with nano‐structure were prepared at ambient temperature on (111) silicon substrates by filtered cathodic arc plasma (FCAP) technology with an in‐plane β€œS” filter. The effects of substrate bias and argon flux on the crystal grain size, roughness