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Effect of Pd and Rh metals on electrical properties of the Si-SiO2 interface

✍ Scribed by S.Y. Li; T.J. Zhang; S.S. Li; Y.Z. Wang

Publisher
Elsevier Science
Year
1985
Tongue
English
Weight
298 KB
Volume
54
Category
Article
ISSN
0038-1098

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Rh/SiO 2 , to be used as a potential catalytic material, was prepared using sol+gel processing. Tetraethoxysilane (TEOS) was used as the support precursor and Rh(acac) 3 was used as the metal precursor. Nitrogen full-sorption was used to determine surface area, average pore size, and total pore volu