Microstructure and magnetic properties o
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Hu, J. F. ;Chen, J. S. ;Lim, B. C. ;Liu, B.
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Article
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2008
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John Wiley and Sons
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English
β 438 KB
## Abstract FePtβSiO~2~ films with different volume percentage (0β20%) of SiO~2~ were prepared by a coβsputtering process at a substrate temperature of 350 Β°C. The microstructure and magnetic properties of the composite films were investigated. Inhomogeneous SiO~2~ segregation in the composite film