Effect of oxygen partial pressure on the crystallization of CeO2 and La2Zr2O7 bi-axially textured thin films
β Scribed by A. Guibadj; P. Odier; B. Benbarta; L. Ortega
- Publisher
- Elsevier Science
- Year
- 2011
- Tongue
- English
- Weight
- 929 KB
- Volume
- 328
- Category
- Article
- ISSN
- 0022-0248
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β¦ Synopsis
Films of CeO 2 and La 2 Zr 2 O 7 have been formed by metal-organic decomposition and their crystallization studied under different oxygen partial pressures. Single crystalline substrates were use to model the phenomenon: (0 0 1)SrTiO 3 (STO) for CeO 2 and (0 0 1)LaAlO 3 (LAO) for La 2 Zr 2 O 7 . A chemical interaction has been noticed in the case of CeO 2 /STO above 900 1C, which also depends on the oxygen partial pressure, such an effect was not observed for LZO/LAO. The presence of oxygen, even in traces (10-100 ppm), favors the growth of randomly oriented grains while low oxygen partial pressure provides conditions where the heterogeneous nucleation on the substrate dominates. Once nucleated under low oxygen partial pressure, annealing can be performed under increasing controlled oxygen partial pressure without modification of the texture but with an improved crystallization. Application of this to coated conductors must be restricted in the field where oxidation of the substrate can be avoided.
π SIMILAR VOLUMES
Epitaxial YBa 2 Cu 3 O y (YBCO) thin films have been fabricated by chemical solution deposition (CSD) on La 2 Zr 2 O 7 -buffered YSZ single crystal substrate, where the buffer layer has three kinds of morphologyflat surface, rough surface and pore surface. The effect of LZO buffer layer's roughness