Effect of growth parameters on the heter
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M. Soueidan; G. Ferro; B. Nsouli; F. Cauwet; J. Dazord; G. Younes; Y. Monteil
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Article
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2006
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Elsevier Science
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English
⚖ 994 KB
Epitaxial 3C-SiC(1 1 1) films were grown on 6H-SiC(0 0 0 1) Si face on axis substrates by chemical vapor deposition under H 2 , SiH 4 and C 3 H 8 in a cold wall vertical reactor. Two temperatures were studied (1450 and 1700 • C) with various C/Si ratio and deposition time. It was found that under co