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Effect of nitridation on Fowler–Nordheim tunneling coefficients in SiO2MOS capacitors with WSi2-polysilicon gate

✍ Scribed by S. Croci; C. Plossu; B. Balland; C. Dubois; P. Boivin

Book ID: 110298970
Publisher: Springer US
Year: 2001
Tongue: English
Weight: 346 KB
Volume: 12
Category: Article
ISSN: 0957-4522
DOI: 10.1023/a:1011248428738

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