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Effect of N2-annealing on n-type Si metal-oxide-semiconductor capacitors by using liquid-phase deposition SiO2

✍ Scribed by Gwo-Huei Yang; Wen-Tse Chang; Jun-Dar Hwang; Jun-Hung Lin; Yu-Hung Chen

Book ID: 114461712
Publisher: The Institution of Engineering and Technology
Year: 2011
Tongue: English
Weight: 212 KB
Volume: 6
Category: Article
ISSN: 1750-0443
DOI: 10.1049/mnl.2011.0472

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