Effect of implantation temperature on electrical properties of buried nitride SOI structures: A Chand and S Chandra, Centre for Applied Research in Electronics, Indian Institute of Technology, Hauz Khas, New Delhi- 110016, India

• Publisher: Elsevier Science
• Year: 1989
• Tongue: English
• Weight: 129 KB
• Volume: 39
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/0042-207x(89)91139-1