Effect of hydrogen-argon mixing for sputtered aluminum metallization on MOS devices

✍ Scribed by Serikawa, T.; Yachi, T.

• Book ID: 114593865
• Publisher: IEEE
• Year: 1981
• Tongue: English
• Weight: 338 KB
• Volume: 28
• Category: Article
• ISSN: 0018-9383
• DOI: 10.1109/t-ed.1981.20509