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Effect of hydrogen and temperature on the resistivity of an aluminum-2 wt % copper thin film

โœ Scribed by K. S. Lee; Y. K. Lee


Book ID
111535673
Publisher
Springer
Year
1999
Tongue
English
Weight
790 KB
Volume
34
Category
Article
ISSN
0022-2461

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This paper addresses the effects of substrate temperature on electrical and structural properties of dc magnetron sputter-deposited copper (Cu) thin films on p-type silicon. Copper films of 80 and 500 nm were deposited from Cu target in argon ambient gas pressure of 3.6 mTorr at different substrate