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Effect of high temperature thermal treatment of (100) γ-LiAlO2 substrate on epitaxial growth of ZnO films by plasma-assisted molecular beam epitaxy

✍ Scribed by Chen, S.S.; Pan, X.H.; Ding, P.; Zhang, H.H.; Chen, W.; Dai, W.; Huang, J.Y.; Ye, Z.Z.

No coin nor oath required. For personal study only.

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