Effect of halogen in high-density oxygen plasmas on photoresist trimming
β Scribed by Chian-Yuh Sin; Bing-Hung Chen; W. L. Loh; J. Yu; P. Yelehanka; A. See; L. Chan
- Publisher
- American Institute of Chemical Engineers
- Year
- 2004
- Tongue
- English
- Weight
- 290 KB
- Volume
- 50
- Category
- Article
- ISSN
- 0001-1541
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