Effect of H2 dilution gas on the growth of ZrC during low pressure chemical vapor deposition in the ZrCl4–CH4–Ar system

✍ Scribed by Jong Hoon Park; Choong Hwan Jung; Do Jin Kim; Ji Yeon Park

• Book ID: 108278481
• Publisher: Elsevier Science
• Year: 2008
• Tongue: English
• Weight: 521 KB
• Volume: 203
• Category: Article
• ISSN: 0257-8972
• DOI: 10.1016/j.surfcoat.2008.08.004