## Abstract Cuprous oxide (Cu~2~O) films were formed by dc reactive magnetron sputtering onto glass substrates held at various temperatures in the range 303β648 K. The substrate temperature was found to be an important parameter in controlling the physical properties of the deposited films. The var
β¦ LIBER β¦
Effect of deposition temperature on the physical properties of RF magnetron sputtered Ag-Cu-O films with various Cu to Ag ratios
β Scribed by Uthanna, S. ;Reddy, M. Hari Prasad ;Boulet, P. ;Petitjean, C. ;Pierson, J. F.
- Publisher
- John Wiley and Sons
- Year
- 2010
- Tongue
- English
- Weight
- 385 KB
- Volume
- 207
- Category
- Article
- ISSN
- 0031-8965
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