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Effect of compressive stress on nickel-induced lateral crystallization of amorphous silicon thin films

✍ Scribed by S.Y. Huang; H.L. Lin; C.G. Chao; T.F. Liu


Book ID
113937476
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
774 KB
Volume
520
Category
Article
ISSN
0040-6090

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