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Effect of Chemical Oxidation on the Self-Assembly of Organometallic Block Copolymers

✍ Scribed by Eitouni, Hany B.; Balsara, Nitash P.

Book ID: 121701559
Publisher: American Chemical Society
Year: 2004
Tongue: English
Weight: 51 KB
Volume: 126
Category: Article
ISSN: 0002-7863
DOI: 10.1021/ja048570c

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**Topographical confinement** is used to template the formation of nanoscale domains in a self‐assembled block copolymer film. The topographical template controls the row spacings and feature dimensions of the copolymer and can deliberately introduce defects in the arrays (see Figure). For example,