Effect of C/B ratio in reactants on low-pressure CVD boron-doped carbon deposited from a BCl3–C3H6–H2mixture

✍ Scribed by Yongsheng Liu; Litong Zhang; Laifei Cheng; Wenbin Yang; Yongdong Xu; Qingfeng Zeng

• Book ID: 107562193
• Publisher: Springer US
• Year: 2008
• Tongue: English
• Weight: 552 KB
• Volume: 6
• Category: Article
• ISSN: 1935-3804
• DOI: 10.1007/s11998-008-9128-2