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Effect of argon ion beam voltages on the microstructure of aluminum nitride films prepared at room temperature by a dual ion beam sputtering system

✍ Scribed by Hong-Ying Chen; Sheng Han; Chih-Hsuan Cheng; Han C. Shih

Publisher: Elsevier Science
Year: 2004
Tongue: English
Weight: 262 KB
Volume: 228
Category: Article
ISSN: 0169-4332
DOI: 10.1016/j.apsusc.2004.01.039

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