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Effect of annealing under enhanced hydrostatic pressure on the microstructure of Cz–Si:H, He

✍ Scribed by A. Misiuk; A. Shalimov; B. Surma; J. Bak-Misiuk; A. Wnuk

Book ID
116598608
Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
713 KB
Volume
401
Category
Article
ISSN
0925-8388

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## Abstract Silicon is the dominant material in electronic industry. Its use for various applications requires processing stages, important among them those involving thermal treatments. Such treatments in Si trigger the mechanisms of oxygen aggregation resulting in the formation of oxygen precipit